B. W. Smith, J. Zhou, "Snell or Fresnel – The influence of material index on hyper NA lithography" Proc. SPIE 6520, (2007) paper J. Zhou, N. Lafferty, B. W. Smith, J. H. Burnett, "Immersion ...
Professor Bruce Smith has been a member of the engineering faculty at RIT since joining the Microelectronic Engineering program in 1988. He is currently also the Director of the Microsystems ...
To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...
The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...
New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...
EurekAlert! - Metasurfaces, ultra-compact optical devices capable of "precisely manipulating light," have shown great potential in augmented reality (AR) glasses, holographic projection, biosensing, ...
A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...
There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...
OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...
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